Opto-Edu (Beijing) Co., Ltd. 0086-13911110627 sale@optoedu.com

OPTO-EDU A63.7010 EBL Electron Beam Lithography Machine

Ürünler - Tarama Mikroskop

Vurgulamak

EBL electron beam lithography machine
,
electron beam lithography scanning microscope
,
OPTO-EDU A63.7010 lithography machine
Standart ekipman

Lazer İnterferometre Aşaması
Sahne Gezisi

≤105 mm
Görüntü Çözünürlüğü

≤1nm@15kV; ≤1,5nm@1kV
Işın Akım Yoğunluğu

>5300 A/cm2
Minimum Işın Noktası Boyutu

≤2 nm
Elektron Işını Deklanşör

Yükselme Süresi < 100 ns
Menşe yeri

Çin
Marka adı

CNOEC, OPTO-EDU
Sertifika

CE,
Model numarası

A63.7010
belge

Ürün Broşürü PDF
Min sipariş miktarı

1 adet
Fiyat

FOB $1~1000, Depend on Order Quantity
Ambalaj bilgileri

İhracat Taşımacılığı İçin Karton Ambalaj
Teslim süresi

180 Gün
Ödeme koşulları

T/T, West Union, PayPal
Yetenek temini

5000 Adet/Ay

OPTO-EDU A63.7010 EBL Electron Beam Lithography Machine

button button

Fiyat Al Şimdi başvurun

Stage Specifications
Standard Equipment	Laser Interferometer Stage
Stage Travel	≤105 mm
Electron Gun and Imaging Specitications
Schottky Field Emission Gun	Acceleration Voltage 2OV~ 30kVSide Secondary ElectronDetector and In-Lens Electron Detector
Image Resolution	≤1nm@15kV; ≤1.5nm@1kV
Beam Current Densit	>5300 A/cm2
Minimum Beam Spot Size	≤2 nm
Lithography Specitications
Electron Beam Shutter	Rise Time < 100 ns
Writing Field	≤500x500 um
Minimum Single Exposure Line Width	10±2nm
Scan Speed	25 MHz/ 50 MHz
Graphics Generator Parameters
Control Core	High-performance FPGA
Maximum Scan speed	50 MHz
D/A Resolution	20-bit
Supported Writing Field Sizes	10 um~500 um
Beam Shutter Suppor	5VTTL
Minimum Dwell Time Increment	10ns
Supported File Formats	GDSIl, DXF, BMP, etc.
Faraday Cup Beam Current Measurement	Included
Proximity Effect Correction	Optional
Laser Interferometer Stage	Optional
Scan Modes	Sequential (Z-type), Serpentine (S-type), Spiral, and other vector scan modes
Exposure Modes	Supports field calibration, field stitching, overlay, and multi-layer automatic exposure
External Channel Support	supports electron beam scanning, stage movement, beam shutter controL, andsecondary electron detection

Laser Interferometer Stage

Laser Interferometer Stage: An advanced laser interferometer stage that meets the requirements for large-stroke, high-precision stitching and overlay

Field Emission Gun

A high-resolution field emission gun is an important guarantee for lithography quality

Graphics Generator

Achieves ultra-high resolution pattern drawing while ensuring ultra-high-speed scanning

A63.7010 VS Raith 150 Two
Device Model	OPTO-EDU A63.7010 (China)	Raith 150 Two (Germany)
Acceleration Voltage (kV)	30	30
Min. Beam SpotDiameter (nm)	2	1.6
Stage Size (inch)	4	4
Minimum Linewidth (nm)	10	8
Stitching Accuracy (nm)	50(35nm)	35
Overlay Accuracy (nm)	50(35nm)	35